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Science and Technology of Nanolithography
OVERVIEW
CEA CAPA Partner Institution: Vrije Universiteit Amsterdam
Location: Amsterdam, Netherlands
Primary Subject Area: Physics
Instruction in: English
Transcript Source: Partner Institution
Course Details: Level 400
Recommended Semester Credits: 3
Contact Hours: 45
DESCRIPTION
In state-of-the-art nanolithography a mask containing the layout of a computer chip is imaged, using extreme ultraviolet (EUV) light, onto a thin layer of photo-resist on top of a semiconductor wafer from which the computer chips are fabricated. In this summer course we will follow the path that the light in said state-of-the-art nanolithography takes, and also address the challenges of illuminating wafers and precisely monitoring the imprints of nanostructures on the wafers.
We will cover the surprisingly rich physics behind some of the fundamental processes occurring in Nanolithography. These range from the interaction of intense laser light with metals, the generation of plasmas, the generation of EUV light in plasmas, the creation of good mirrors out of badly reflecting materials, (sub-)nm metrology on semiconductor structures and the light sources needed for such metrology.
Our contribution to this summer course is sharing our enthusiasm at the Advanced Research Center for Nanolithography (ARCNL) where we do exciting fundamental physics at the highest possible level with a relevance to key technologies in nanolithography. We wish to contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature. This all starts with bright students!
Some further background: ARCNL is a public-private partnership between the University of Amsterdam, VU Amsterdam, the Dutch Research Council (NWO), and the semiconductor equipment manufacturer ASML. It combines the best of both worlds: the academic focus on scientific excellence and the industry's focus on a well-defined application areas.
Contact hours listed under a course description may vary due to the combination of lecture-based and independent work required for each course. CEA's recommended credits are based on the contact hours assigned by Vrije Universiteit Amsterdam (VU Amsterdam): 15 contact hours equals 1 U.S. credit
We will cover the surprisingly rich physics behind some of the fundamental processes occurring in Nanolithography. These range from the interaction of intense laser light with metals, the generation of plasmas, the generation of EUV light in plasmas, the creation of good mirrors out of badly reflecting materials, (sub-)nm metrology on semiconductor structures and the light sources needed for such metrology.
Our contribution to this summer course is sharing our enthusiasm at the Advanced Research Center for Nanolithography (ARCNL) where we do exciting fundamental physics at the highest possible level with a relevance to key technologies in nanolithography. We wish to contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature. This all starts with bright students!
Some further background: ARCNL is a public-private partnership between the University of Amsterdam, VU Amsterdam, the Dutch Research Council (NWO), and the semiconductor equipment manufacturer ASML. It combines the best of both worlds: the academic focus on scientific excellence and the industry's focus on a well-defined application areas.
Contact hours listed under a course description may vary due to the combination of lecture-based and independent work required for each course. CEA's recommended credits are based on the contact hours assigned by Vrije Universiteit Amsterdam (VU Amsterdam): 15 contact hours equals 1 U.S. credit
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